1. MD. AMZAD HOSSAIN - Department of Electrical and Electronic Engineering, Jashore University of Science and Technology,
Jashore -7408, Bangladesh & Graduate School of Science and Engineering, Saga University, Saga, 840-8502, Japan.
2. MD. ABDUL MAJED PATWARY - Department of Electrical and Electronic Engineering, Jashore University of Science and Technology,
Jashore -7408, Bangladesh & Department of Chemistry, Comilla University, Comilla -3506, Bangladesh.
3. MD. MUSTAFIZUR RAHMAN - Department of Electrical and Electronic Engineering, Jashore University of Science and Technology,
Jashore -7408, Bangladesh.
4. FATEMA TUZ ZAHURA - Department of Electrical and Electronic Engineering, Jashore University of Science and Technology,
Jashore -7408, Bangladesh.
In this study, the introduction of plasma and its various typical parameters were discussed. The advantages and disadvantages of radio-frequency (RF) magnetized plasma sputtering sources based on effective target utilization were presented. It was shown that the effect of the plasma sheath in RF magnetized plasma sputtering sources decreases the plasma density near the chamber wall. The principle of magnetron sputtering, demonstrating the direction of electric and magnetic fields, charged particle motions, and target erosion, was demonstrated. The direction of E × B drift motion in the presence of electric and magnetic fields and its role in producing plasma discharges were presented. The conventional and current research of magnetron sputtering systems was discussed. Moreover, functional thin film deposition using plasma sputtering sources and its background, as well as problems associated with effective target utilization, were discussed in detail.
Plasma, Magnetized, Sputtering Sources, Target Utilization, Thin Film